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Beilstein J. Nanotechnol. 2019, 10, 135–143, doi:10.3762/bjnano.10.13
Figure 1: Mass spectra of the argon cluster beam ionized by electrons with the energies of 17 and 150 eV. The...
Figure 2: Sputtering yield versus the average density of the pressed nanopowder. Data on bulk Si is also show...
Figure 3: The sputtering depth (a) and sputtering yield (b) dependence on the ion dose of the nanopowder Si i...
Figure 4: The roughness of the Si nanopowder versus the ion dose at different energies. The dashed line repre...
Figure 5: AFM images of the Si nanopowder surface before (a) and after irradiation by the cluster beam at an ...
Figure 6: The sputtering depth (a) and sputtering yield (b) dependence of the Si nanopowder and bulk Si on en...
Figure 7: The roughness of the nanopowder Si versus the energy at different ion doses. The broken line repres...